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US Patent Issued to Carl Zeiss Microscopy on Sept. 8 for "Device and method for preparing microscopic samples via backside thinning" (German Inventor)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,757, issued on Sept. 8, was assigned to Carl Zeiss Microscopy GmbH (Jena, Germany). "Device and method for preparing microscopic samples vi... Read More


US Patent Issued to JIANGSU LEUVEN INSTRUMENTS on Sept. 8 for "Ion beam etching machine and lower electrode structure thereof" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,758, issued on Sept. 8, was assigned to JIANGSU LEUVEN INSTRUMENTS Co. LTD. (Xuzhou, China). "Ion beam etching machine and lower electrode ... Read More


US Patent Issued to NuFlare Technology on Sept. 8 for "Beam detector, multi-charged-particle-beam irradiation apparatus, and adjustment method for beam detector" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,759, issued on Sept. 8, was assigned to NuFlare Technology Inc. (Yokohama, Japan). "Beam detector, multi-charged-particle-beam irradiation ... Read More


US Patent Issued to HITACHI HIGH-TECH on Sept. 8 for "Spin-polarized scanning electron microscope" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,760, issued on Sept. 8, was assigned to HITACHI HIGH-TECH Corp. (Tokyo). "Spin-polarized scanning electron microscope" was invented by Teru... Read More


US Patent Issued to Tokyo Electron on Sept. 8 for "Method for plasma processing" (Texas Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,762, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Method for plasma processing" was invented by Justin Moses (Austin, T... Read More


US Patent Issued to Tokyo Electron on Sept. 8 for "Plasma processing system, assistance device, assistance method, and assistance program" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,763, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing system, assistance device, assistance method, and a... Read More


US Patent Issued to Tokyo Electron on Sept. 8 for "Substrate processing method and plasma processing apparatus" (Japanese, American Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,764, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method and plasma processing apparatus" was inve... Read More


US Patent Issued to Tokyo Electron on Sept. 8 for "Substrate processing method and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,765, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method and substrate processing apparatus" was i... Read More


US Patent Issued to BEIJING NAURA MICROELECTRONICS EQUIPMENT on Sept. 8 for "Substrate support including multiple radio frequency (RF) electrodes" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,766, issued on Sept. 8, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing). "Substrate support including multiple ... Read More


US Patent Issued to Applied Materials on Sept. 8 for "Chucking status detection with chucking sensor normalized figure of merit and active chucking voltage control" (California Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,767, issued on Sept. 8, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Chucking status detection with chucking sensor norma... Read More